Description
1.1 This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.
1.2 This standard sets purity grade levels, physical attributes, analytical methods, and packaging.
1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.
Product Details
- Published:
- 12/10/2002
- Number of Pages:
- 3
- File Size:
- 1 file , 33 KB
- Note:
- This product is unavailable in Russia, Ukraine, Belarus
